Interdiffusion and precipitation in Al‒Hf thin-film couples
- M. Wittmer
- F. Legoues
- et al.
- 1986
- Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
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46 results for M. Wittmer
Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Low-temperature diffusion of dopant atoms in silicon during interfacial silicide formation
- M. Wittmer
- K.N. Tu
- 1984
- Physical Review B
Barrier Layers: Principles and applications in microelectronics
- Marc Wittmer
- 1984
- JVSTA
Investigation of the Al/TiSi2/Si contact system
- Chung Yu Ting
- Marc Wittmer
- 1983
- Journal of Applied Physics
Reduction of contact resistivity by As redistribution during Pd 2Si formation
- I. Ohdomari
- M. Hori
- et al.
- 1983
- Journal of Applied Physics
Growth kinetics of platinum silicide
- Marc Wittmer
- 1983
- Journal of Applied Physics
Redistribution of As during Pd2Si formation: Electrical measurements
- M. Wittmer
- C.-Y. Ting
- et al.
- 1983
- Journal of Applied Physics
Silicide contacts for shallow junction devices
- Marc Wittmer
- 1983
- Thin Solid Films
Investigation of Tin films reactively sputtered using a sputter gun
- K.Y. Ahn
- M. Wittmer
- et al.
- 1983
- Thin Solid Films