Fabrication challenges for next-generation devices: Microelectromechanical systems for radio-frequency wireless communications
- David Seeger
- Jennifer Lund
- et al.
- 2003
- Journal of Microlithography, Microfabrication and Microsystems
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24 results for David Seeger
Photochemical Cleavage of a Polymeric Solid: Details of the Ultraviolet Laser Ablation of Poly(methyl methacrylate) at 193 and 248 nm
- R. Srinivasan
- Bodil Braren
- et al.
- 2002
- Macromolecules
Fabrication challenges for next generation devices: MEMS for RF wireless communications
- David Seeger
- Jennifer Lund
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Thin-film imaging: Past, present, prognosis
- David Seeger
- D.C. La Tulipe Jr.
- et al.
- 1997
- IBM J. Res. Dev
Diazoquinone positive photoresist for x-ray lithography
- A. Aviram
- Daniel Bucca
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- R. Viswanathan
- David Seeger
- et al.
- 1994
- Microelectronic Engineering
Positive mode silylation process characterization
- D.C. La Tulipe
- A.T.S. Pomerene
- et al.
- 1992
- Microelectronic Engineering
A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- Michael G. Rosenfield
- S. Rishton
- et al.
- 1991
- Microelectronic Engineering
Importance of adsorption in ion beam induced deposition of carbon
- S.J. Kirch
- David Seeger
- 1990
- Applied Physics Letters
X-ray transmission through low atomic number particles
- R.A. DellaGuardia
- David Seeger
- et al.
- 1989
- Microelectronic Engineering