EXPERIMENTAL TECHNOLOGY AND CHARACTERIZATION OF SELF-ALIGNED 0. 1 mu M-GATE-LENGTH LOW-TEMPERATURE OPERATION NMOS DEVICES.G.A. Sai-HalaszM.R. Wordemanet al.1986IEDM 1986
Design and Experimental Technology for 0.1-μm Gate-Length Low-Temperature Operation FET'sGeorge A. Sai-HalaszMatthew R. Wordemanet al.1987IEEE Electron Device Letters