Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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80 results for J. Hoffnagle

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- - G.M. Wallraff
  - D. Medeiros
  - et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fast calculation of images for high numerical aperture lithography
- - Alan E. Rosenbluth
  - Gregg Gallatin
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Liquid immersion lithography - Evaluation of resist issues
- - William Hinsberg
  - Gregory Wallraff
  - et al.
- 2004
- Microlithography 2004
An achromatic refractive laser beam reshaper
- - C. Michael Jefferson
  - John A. Hoffnagle
- 2003
- SPIE Optical Science and Technology 2003
Beam shaping with a plano-aspheric lens pair
- - John A. Hoffnagle
  - C. Michael Jefferson
- 2003
- Opt. Eng.
Extendibility of chemically amplified amplified resists: Another brick wall?
- - William Hinsberg
  - Frances Houle
  - et al.
- 2003
- Microlithography 2003
Characterization of photoresist spatial resolution by interferometric lithography
- - John A. Hoffnagle
  - William D. Hinsberg
  - et al.
- 2003
- Microlithography 2003
Chirped excitation of optically-dense inhomogeneously broadened media using Eu³⁺:Y₂SiO₅
- - T.L. Harris
  - G.W. Burr
  - et al.
- 2003
- CLEO 2003
Chirped excitation of optically-dense inhomogeneously broadened media using Eu³⁺:Y₂SiO₅
- - T.L. Harris
  - G.W. Burr
  - et al.
- 2003
- CLEO 2003
Sensitivity of a refractive beam reshaper to figure error
- - John A. Hoffnagle
- 2002
- SPIE Optical Science and Technology 2002