Copper deposition by electron cyclotron resonance plasma
- A. Sugerrnan
- F.E. Turene
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
Date
Featured collections
Popular topics
9 results for William Holber
A fluid description for the discharge equilibrium of a divergent electron cyclotron resonance plasma source
- G. Guan
- M.E. Mauel
- et al.
- 1992
- Physics of Fluids B
Wavelength-modulated interferometric thermometry for improved substrate temperature measurement
- K.L. Saenger
- F. Tong
- et al.
- 1992
- Review of Scientific Instruments
GaAs-oxide removal using an electron cyclotron resonance hydrogen plasma
- Z. Lu
- M.T. Schmidt
- et al.
- 1991
- Applied Physics Letters
The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
- John B.O. Caughman
- William M. Holber
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Doppler profile measurement of Ar and Ar+ translational energies in a divergent magnetic field electron cyclotron resonance source
- John S. McKillop
- John C. Forster
- et al.
- 1989
- Applied Physics Letters
Plasma characterization for a divergent field electron cyclotron resonance source
- John Forster
- William Holber
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Optical emission characterization of a divergent magnetic field electron cyclotron resonance source
- John S. McKillop
- John C. Forster
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Anisotropic electrical properties of epitaxial YBa2Cu3O7-δ films on (110) SrTiO3
- A. Gupta
- G. Koren
- et al.
- 1989
- Physica C: Superconductivity and its applications