Study particle emission in vacuum from film deposits
- Joseph S. Logan
- James J. McGill
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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8 results for Joseph S. Logan
Copper deposition by electron cyclotron resonance plasma
- A. Sugerrnan
- F.E. Turene
- et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Wavelength-modulated interferometric thermometry for improved substrate temperature measurement
- K.L. Saenger
- F. Tong
- et al.
- 1992
- Review of Scientific Instruments
Sub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- M.B. Ketchen
- D.J. Pearson
- et al.
- 1991
- Applied Physics Letters
R.F. diode sputtering
- Joseph S. Logan
- 1990
- Thin Solid Films
High rate radio frequency sputtering using in-phase plasma confinement
- James E. Lucy
- John Costable
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A study of voids in sputtered Si02
- Mitchell J. Hait
- Harris C. Jones
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of aluminum oxide
- Fletcher Jones
- Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films