Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Publications
Date
Featured collections
Popular topics
14 results for Roderick R. Kunz
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Materials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Comparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Resolution and etch resistance of a family of 193 nm positive resists
- R.D. Allen
- I.Y. Wan
- et al.
- 1995
- J. Photopolym. Sci. Tech.
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Polysilane photoresists for 193 and 248 nm lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
Thin-film imaging: Past, present, prognosis
- David Seeger
- D.C. La Tulipe Jr.
- et al.
- 1997
- IBM J. Res. Dev