Factors affecting reactive ion etching of corning 7059 glass
- Yue Kuo
- J.R. Crowe
- 1989
- Proceedings of SPIE 1989
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Reactive ion etching of a multicomponent glass substrate
- Yue Kuo
- J.R. Crowe
- 1989
- Proceedings of SPIE 1989
Reactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases
- Yue Kuo
- 2019
- JES
Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching
- Yue Kuo
- 2019
- JES
A new process using two photo-masks to prepare trilayer thin film transistors
- Yue Kuo
- 2019
- JES
Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
A Self-Aligned, Trilayer, A-Si:H Thin Film Transistor Prepared from Two Photomasks
- Yue Kuo
- 2019
- JES
Plasma enhanced chemical vapor deposited silicon nitride as a gate dielectric film for amorphous silicon thin film transistors - A critical review
- Yue Kuo
- 1998
- Vacuum
Reactive ion etching of indium tin oxide by SiCl4-based plasmas - Substrate temperature effect
- Yue Kuo
- 1998
- Vacuum