Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A 157-dot-per-inch, 262K-color, 10.5-in.-diagonal, 1280 × 1024 (SXGA) display has been fabricated using a six-mask process with Cu or Al-alloy thin-film gates. The combination of high resolution and gray-scale accuracy has been shown to render color images and text with paperlike legibility. The low-resistivity gate metallization and trilayer-type TFTs with a channel length of 6-8 μm were fabricated with a six-mask process which is extendible to larger, higher-resolution displays. A combination of double-sided driving and active line repair was used so that open gate lines or data lines did not result in visible line defects. A flexible drive-electronics system was developed to address the display and characterize its performance under different drive conditions.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
J.M.E. Harper, K.P. Rodbell, et al.
Journal of Applied Physics
Fan Jing Meng, Ying Huang, et al.
ICEBE 2007
S. Sattanathan, N.C. Narendra, et al.
CONTEXT 2005