D.Y. Shih, J. Paraszczak, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
D.Y. Shih, J. Paraszczak, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Alan Lien, C. Cai, et al.
MRS Spring Meeting 1999
J.P. Gambino, E.G. Colgan
Materials Chemistry and Physics
E.G. Colgan, P.M. Alt, et al.
IBM J. Res. Dev