J.M.E. Harper, K.P. Rodbell, et al.
MRS Spring Meeting 1997
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
J.M.E. Harper, K.P. Rodbell, et al.
MRS Spring Meeting 1997
S.C. Lien, C. Cai, et al.
Japanese Journal of Applied Physics, Part 2: Letters
Robert L. Melcher, P.M. Alt, et al.
IBM J. Res. Dev
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005