S.C. Lien, C. Cai, et al.
Japanese Journal of Applied Physics, Part 2: Letters
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
S.C. Lien, C. Cai, et al.
Japanese Journal of Applied Physics, Part 2: Letters
J. Knickerbocker, P. Andry, et al.
ECTC 2006
E.G. Colgan, F.M. D'Heurle
Journal of Applied Physics
L. Clevenger, B. Arcot, et al.
MRS Spring Meeting 1996