On the effect of bonded hydrogen in the local microstructure of PECVD SiNx:H filmsE.C. PalouraY. Kuoet al.1995Physica B: Physics of Condensed Matter
Thin-film transistors with multistep deposited amorphous silicon layersYue Kuo1995Applied Physics Letters
PECVD Silicon Nitride as a Gate Dielectric for Amorphous Silicon Thin Film Transistor Process and Device PerformanceYue Kuo1995JES
Etch mechanism in the low refractive index silicon nitride plasma-enhanced chemical vapor deposition processYue Kuo1993Applied Physics Letters
Reactive ion etching of sputter deposited tantalum with Cf4, Cf3Cl, and CHF3Yue Kuo1993Japanese Journal of Applied Physics