High Performance 0.1 μm CMOS Devices with 1.5 V Power Supply
- Y. Taur
- S.J. Wind
- et al.
- 1993
- IEDM 1993
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13 results for M.G.R. Thomson
A full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEDM 1991
A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- John D. Cressler
- James Warnock
- et al.
- 1992
- IEEE Electron Device Letters
Electron beam microcolumn for multi-beam applications
- E. Kratschmer
- H.S. Kim
- et al.
- 1995
- IVMC 1995
Electron-beam microcolumn technology and applications
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1995
- SPIE Optical Science, Engineering, and Instrumentation 1995
Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
Performance of Zr/O/W Schottky emitters at reduced temperatures
- H.S. Kim
- M.L. Yu
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Energy distributions of Zr/O/W Schottky electron emission
- H.S. Kim
- M.L. Yu
- et al.
- 1997
- Journal of Applied Physics
The electrostatic moving objective lens and optimized deflection systems for microcolumns
- M.G.R. Thomson
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Electron beam technology - SEM to microcolumn
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Microelectronic Engineering