Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
- Darío L. Goldfarb
- Juan J. De Pablo
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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13 results for J.P. Simons
Transfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Positive mode silylation process characterization
- D.C. La Tulipe
- A.T.S. Pomerene
- et al.
- 1992
- Microelectronic Engineering