Competitive and cost effective copper/low-k interconnect (BEOL) for 28 nm CMOS technologiesR. AugurC. Childet al.2012Microelectronic Engineering
Competitive and cost effective copper/low-k interconnect (BEOL) for 28nm CMOS technologiesRod AugurCraig Childet al.2010ADMETA 2010
A SiCOH BEOL interconnect technology for high density and high performance 65 nm CMOS applicationsMatthew AngyalJason Gillet al.2005AMC 2005
High performance and low power transistors integrated in 65nm bulk CMOS technologyZ. LuoA. Steegenet al.2004IEDM 2004