Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for L. Yu

A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices
- - Nicolas Loubet
  - T. Devarajan
  - et al.
- 2019
- IEDM 2019
Full Bottom Dielectric Isolation to Enable Stacked Nanosheet Transistor for Low Power and High Performance Applications
- - J. Zhang
  - S. Pancharatnam
  - et al.
- 2019
- IEDM 2019
Advanced Arsenic Doped Epitaxial Growth for Source Drain Extension Formation in Scaled FinFET Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2018
- IEDM 2018
External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS Technology
- - Oleg Gluschenkov
  - Heng Wu
  - et al.
- 2018
- IEDM 2018
Parasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nm
- - Heng Wu
  - Oleg Gluschenkov
  - et al.
- 2018
- IEDM 2018