A high performance 90 nm SOI technology with 0.992 μm2 6T-SRAM cell
- Mukesh Khare
- S. Ku
- et al.
- 2002
- IEDM 2002
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14 results for R. Ferguson
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
The mask error factor in optical lithography
- Alfred K. Wong
- Richard A. Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
0.18 μm high-performance logic technology
- S.W. Crowder
- S. Greco
- et al.
- 1999
- VLSI Technology 1999
Approach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering
Electrical characterization of across-field lithographic performance for 256m bit dram technologies
- Junichiro Iba
- Kohji Hashimoto
- et al.
- 1995
- SPIE Photomask Japan 1995
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994