Cyclophosphazene-containing polymers as imprint lithography resists
- Erik C. Hagberg
- Mark W. Hart
- et al.
- 2007
- Journal of Inorganic and Organometallic Polymers and Materials
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17 results for Mark W. Hart
Patterning ∼20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask
- Linnea Sundström
- Leslie Krupp
- et al.
- 2006
- Applied Physics Letters
Contact mechanics of a flexible imprinter for photocured nanoimprint lithography
- G.M. McClelland
- C.T. Rettner
- et al.
- 2005
- Tribology Letters
Patterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrate
- Zach L. Hogan
- Cortney R. Kreller
- et al.
- 2004
- Materials Science and Engineering C
Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold
- Gary M. McClelland
- Mark W. Hart
- et al.
- 2002
- Applied Physics Letters
Multiple light scattering model applied to reflective display materials
- R. Barchini
- J.G. Gordon II
- et al.
- 1998
- Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Development of medium energy ion scattering and magneto-optic Kerr effect apparatus for characterizing ultrathin magnetic films
- David E Fowler
- Mark W Hart
- et al.
- 1995
- Vacuum