Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
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17 results for Mark W. Hart
Controlling linewidth roughness in step and flash imprint lithography
- Gerard M. Schmid
- Niyaz Khusnatdinov
- et al.
- 2008
- EMLC 2008
Minimizing linewidth roughness in Step and Flash Imprint Lithography
- Niyaz Khusnatdinov
- Gerard M. Schmid
- et al.
- 2008
- Microelectronic Engineering
High-aspect-ratio cylindrical nanopore arrays and their use for templating titania nanoposts
- Oun-Ho Park
- Joy Y. Cheng
- et al.
- 2008
- Advanced Materials
Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Cyclophosphazene-containing polymers as imprint lithography resists
- Erik C. Hagberg
- Mark W. Hart
- et al.
- 2007
- Journal of Inorganic and Organometallic Polymers and Materials
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Patterning ∼20 nm half-pitch lines on silicon using a self-assembled organosilicate etch mask
- Linnea Sundström
- Leslie Krupp
- et al.
- 2006
- Applied Physics Letters
Contact mechanics of a flexible imprinter for photocured nanoimprint lithography
- G.M. McClelland
- C.T. Rettner
- et al.
- 2005
- Tribology Letters