Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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39 results for Linda K. Sundberg

Two complementary methods to characterize long range proximity effects due to develop loading
- - Linda K. Sundberg
  - Greg M. Wallraff
  - et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
High contact angle fluorosulfonamide-based materials for immersion lithography
- - Daniel P. Sanders
  - Linda K. Sundberg
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A method to characterize pattern density effects: Chemical flare and develop loading
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Hybrid Resist Systems Based on a-Substituted Acrylate Copolymers
- - Hiroshi Ito
  - Linda K. Sundberg
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Self-segregating materials for immersion lithography
- - Daniel P. Sanders
  - Linda K. Sundberg
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Integration of polymer self-assembly for lithographic application
- - Joy Y. Cheng
  - Daniel P. Sanders
  - et al.
- 2008
- SPIE Advanced Lithography 2008
The effect of photoresist/topcoat properties on defect formation in immersion lithography
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 2007
- Proceedings of SPIE 2007
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- - Daniel P. Sanders
  - Linda K. Sundberg
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Contact angles & structure/surface property relationships of immersion materials 65191Q
- - Linda K. Sundberg
  - Daniel P. Sanders
  - et al.
- 2007
- SPIE Advanced Lithography 2007