Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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11 results for Ian Stobert
Etch correction and OPC, a look at the current state and future of etch correction
- Ian Stobert
- Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Strategies for single patterning of contacts for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- ASMC 2011
Contact patterning strategies for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- SPIE Advanced Lithography 2011
Predicting and reducing substrate induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008
Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs
- Donald Samuels
- Ian Stobert
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
The effect of the OPC parameters on the performance of the OPC model
- Amr Abdo
- Ahmed Seoud
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
300-mm Monolithic Silicon Photonics Foundry Technology
- Ken Giewont
- Karen Nummy
- et al.
- 2019
- IEEE JSTQE