Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
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21 results for Ravi Bonam
An OCD perspective of line edge and line width roughness metrology
- Ravi Bonam
- R. Muthinti
- et al.
- 2017
- SPIE Advanced Lithography 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- Ravi Bonam
- Chi Chun Liu
- et al.
- 2017
- SPIE Advanced Lithography 2017
Materials characterization for multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
Large area three dimensional structure fabrication using multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers
- Luciana Meli
- Scott D. Halle
- et al.
- 2016
- ASMC 2016
Printability of buried extreme ultraviolet lithography photomask defects
- Kazunori Seki
- Takeshi Isogawa
- et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- Scott D. Halle
- Luciana Meli
- et al.
- 2015
- SPIE Advanced Lithography 2015
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014