Mukta Farooq, Arvind Kumar, et al.
ECTC 2022
Three dimensional nanostructures are of great interest in photonics and optical sensor communities. Although there are many theoretical models developed, lithographic reduction to practice is an ongoing challenge. Numerous lithographic techniques have been proposed for fabricating three dimensional structures with applications in photonics. We demonstrate a novel three-dimensional electron beam fabrication method that is precise, fast, intrinsically self-aligned and has the ability to produce large area patterns.
Mukta Farooq, Arvind Kumar, et al.
ECTC 2022
Jennifer Church, Luciana Meli, et al.
SPIE Advanced Lithography 2020
Jennifer Church, Luciana Meli, et al.
J. Micro/Nanolithogr. MEMS MOEMS
Ravi Bonam, Hung-Yu Tien, et al.
SPIE Advanced Lithography 2014