Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- Michael J. Maher
- Christopher M. Bates
- et al.
- 2015
- J. Photopolym. Sci. Tech.
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68 results for Dan Sanders
Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly
- Ankit Vora
- Anindarupa Chunder
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Directed self-assembly of topcoat-free, Integration-friendly high-χ block copolymers
- Ankit Vora
- Anindarupa Chunder
- et al.
- 2014
- J. Photopolym. Sci. Tech.
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Directed self-assembly on sparse chemical patterns for lithographic applications
- Joy Y. Cheng
- Alshakim Nelson
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
Essential Step Toward Mining Big Polymer Data: PolyName2Structure, Mapping Polymer Names to Structures
- Chieh Lin
- Pei-Hua Wang
- et al.
- 2020
- ACS Applied Polymer Materials
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives
- Ankit Vora
- Kristin Schmidt
- et al.
- 2016
- ACS AMI