An Analytical Metal Resistance Model and Its Application for Sub-22-nm Metal-Gate CMOS
- X. Miao
- Ruqiang Bao
- et al.
- 2015
- IEEE Electron Device Letters
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.