0.026μm2 high performance Embedded DRAM in 22nm technology for server and SOC applications
- C. Pei
- G. Wang
- et al.
- 2014
- IEDM 2014
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19 results for Karen Nummy
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
- S. Narasimha
- P. Chang
- et al.
- 2012
- IEDM 2012
Scaling deep trench based eDRAM on SOI to 32nm and beyond
- G. Wang
- D. Anand
- et al.
- 2009
- IEDM 2009
(110) Channel, SiON gate-dielectric PMOS with record high Ion=1 mA/μm through channel stress and source drain external resistance (R ext) engineering
- B. Yang
- A. Waite
- et al.
- 2007
- IEDM 2007
High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- S. Narasimha
- K. Onishi
- et al.
- 2006
- IEDM 2006
Monolithically integrated silicon nitride platform
- Yusheng Bian
- Colleen Meagher
- et al.
- 2021
- OFC 2021
Monolithically integrated silicon nitride platform
- Yusheng Bian
- Colleen Meagher
- et al.
- 2021
- OFC 2021
A CMOS Compatible Monolithic Fiber Attach Solution with Reliable Performance and Self-Alignment
- Bo Peng
- Tymon Barwicz
- et al.
- 2020
- OFC 2020
Optical return loss control in silicon photonic metamaterial waveguides
- Bo Peng
- Tymon Barwicz
- et al.
- 2019
- FiO 2019
FEC-free 60-Gb/s silicon photonic link using SiGe-driver ICs hybrid-integrated with photonics-enabled CMOS
- Benjamin G. Lee
- Nicolas Dupuis
- et al.
- 2018
- OFC 2018