Integration and optimization of embedded-SiGe, compressive and tensile stressed liner films, and stress memorization in advanced SOI CMOS technologies
- M. Horstmann
- A. Wei
- et al.
- 2005
- IEDM 2005
Publications
12 results for John Pellerin
CVD rhenium and PVD tantalum gate MOSFETs fabricated with a replacement technique
- James Pan
- Don Canaperi
- et al.
- 2004
- IEEE Electron Device Letters