Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Hiroaki Niimi

Technology viable DC performance elements for Si/SiGe channel CMOS FinFTT
- - G. Tsutsui
  - Ruqiang Bao
  - et al.
- 2016
- IEDM 2016
FinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloys
- - Oleg Gluschenkov
  - Zuoguang Liu
  - et al.
- 2016
- IEDM 2016
A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Sub-10^-9 Ω-cm² n-Type Contact Resistivity for FinFET Technology
- - Hiroaki Niimi
  - Zuoguang Liu
  - et al.
- 2016
- IEEE Electron Device Letters
Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability
- - Zuoguang Liu
  - Oleg Gluschenkov
  - et al.
- 2017
- VLSI Technology 2017