Conference paperDual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variabilityZuoguang Liu, Oleg Gluschenkov, et al.VLSI Technology 2017
Conference paperSeparation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFETMiaomiao Wang, Zuoguang Liu, et al.IRPS 2015
Conference paperImproved frequency response in a SiGe npn device through improved dopant activationJim Adkisson, Marwan H. Khater, et al.ECS Meeting 2012
PaperImproved Air Spacer for Highly Scaled CMOS TechnologyKangguo Cheng, Chanro Park, et al.IEEE Transactions on Electron Devices
