Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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49 results for Hoa Truong

ArF excimer laser resists based on fluoroalcohol
- - Hiroshi Ito
  - H.D. Truong
  - et al.
- 2006
- Polymers for Advanced Technologies
Investigations of the adhesion of maleic anhydride/cyclic olefin alternating copolymers to silicon substrates: Improved materials for 193 NM lithography
- - Anthony J. Pasquale
  - Timothy E. Long
  - et al.
- 2002
- Journal of Adhesion
Aliphatic platforms for the design of 157 nm chemically amplified resists
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Evolution of a 193 nm bilayer resist for manufacturing
- - R.W. Kwong
  - M. Khojasteh
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- - Hiroshi Ito
  - Greg M. Wallraff
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- - Ranee Kwong
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- - N. Fender
  - P.J. Brock
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- - T. Kajita
  - Y. Nishimura
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Development of 157 nm positive resists
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures