Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
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24 results for Edmund M. Sikorski
Minimizing linewidth roughness in Step and Flash Imprint Lithography
- Niyaz Khusnatdinov
- Gerard M. Schmid
- et al.
- 2008
- Microelectronic Engineering
Highly porous silicon membrane fabrication using polymer self-assembly
- C.T. Black
- K.W. Guarini
- et al.
- 2006
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Process integration of self-assembled polymer templates into silicon nanofabrication
- K.W. Guarini
- C.T. Black
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures