Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
A set of key processes for nanometer-scale pattern transfer using a self-assembled polymer mask was developed and integrated. As a result, a variety of silicon nanostructures were built.
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Peter J. Price
Surface Science
J.H. Stathis, R. Bolam, et al.
INFOS 2005
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS