Novel enhanced stressor with graded embedded SiGe source/drain for high performance CMOS devices
- J.-P. Han
- H. Utomo
- et al.
- 2006
- IEDM 2006
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12 results for Rainer Loesing
Hafnium oxide gate dielectrics on sulfur-passivated germanium
- Martin M. Frank
- Steven J. Koester
- et al.
- 2006
- Applied Physics Letters