Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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99 results for Robert Allen

Graded spin-on organic bottom antireflective coating for high na immersion lithography
- - Dario L. Goldfarb
  - Libor Vyklicky
  - et al.
- 2008
- J. Photopolym. Sci. Tech.
Trends in patterning materials for advanced lithography
- - Robert D. Allen
- 2007
- J. Photopolym. Sci. Tech.
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- - R.D. Allen
  - G. Breyta
  - et al.
- 2006
- J. Photopolym. Sci. Tech.
Design of protective topcoats for immersion lithography
- - Robert D. Allen
  - Phillip J. Brock
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- - Hiroshi Ito
  - H.D. Truong
  - et al.
- 2002
- J. Photopolym. Sci. Tech.
Novel classes of cyclic olefin polymers for 193 nm lithography
- - P. Rao Varanasi
  - R.D. Allen
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Novel fluoropolymers for use in 157 nm lithography
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- J. Photopolym. Sci. Tech.
Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials
- - Robert D. Allen
  - Carl E. Larson
  - et al.
- 2000
- J. Photopolym. Sci. Tech.
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- - R.D. Allen
  - Juliann Opitz
  - et al.
- 1999
- J. Photopolym. Sci. Tech.