EUVL mask process development and verification using advanced modeling and characterization techniques
- Michael Green
- Romain Lallement
- et al.
- 2020
- SPIE Advanced Lithography 2020
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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8 results for Chris Progler
EUV mask challenges and requirements for ultimate single exposure interconnects
- Chris Progler
- Michael Green
- et al.
- 2019
- SPIE Advanced Lithography 2019
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Scattered light: The increasing problem for 193 nm exposure tools and beyond
- Kafai Lai
- Chung-Hsi Wu
- et al.
- 2001
- Microlithography 2001
Simulation enabled decision making in advanced lithographic manufacturing
- C. Progler
- 2001
- Microelectronic and MEMS Technologies 2001
Zernike coefficients: Are they really enough?
- C. Progler
- Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Optical lens specifications from the user's perspective
- Christopher J. Progler
- Donald C. Wheeler
- 1998
- SPIE Advanced Lithography 1998
Understanding high numerical aperture optical lithography
- D. Flagello
- Alan E. Rosenbluth
- et al.
- 1992
- Microelectronic Engineering