Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
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19 results for Margaret C. Lawson
Advanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998
Exploring acidic functionalities in the design and development of high performance 193nm photoresist polymers
- P.R. Varanasi
- W. Li
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Dario L. Goldfarb
- Arpan P. Mahorowala
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Post-modification as a way to improve the lithographic performance of resist materials
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering