Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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32 results for Ruqiang Bao

Gate-Cut-Last in RMG to Enable Gate Extension Scaling and Parasitic Capacitance Reduction
- - A. Greene
  - Huimei Zhou
  - et al.
- 2019
- VLSI Technology 2019
Plasma treatment effect on gate stack electrical properties
- - Tao Li
  - Chanro Park
  - et al.
- 2018
- ANTS 2018
Leakage aware Si/SiGe CMOS FinFET for low power applications
- - G. Tsutsui
  - C. Durfee
  - et al.
- 2018
- VLSI Technology 2018
Differentiated performance and reliability enabled by multi-work function solution in RMG Silicon and SiGe MOSFETs
- - Ruqiang Bao
  - Richard G. Southwick
  - et al.
- 2018
- VLSI Technology 2018
Understanding the interfacial layer formation on strained Si_1-xGe_x channels and their correlation to inversion layer hole mobility
- - Choonghyun Lee
  - Richard G. Southwick
  - et al.
- 2017
- VLSI Technology 2017
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
- - N. Loubet
  - T.B. Hook
  - et al.
- 2017
- VLSI Technology 2017
Interface engineering of Si_1-xGe_x gate stacks for high performance dual channel CMOS
- - Choonghyun Lee
  - Richard G. Southwick
  - et al.
- 2017
- ASICON 2017
Development of TiO₂ containing hardmasks through PEALD deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Selective GeO_x-scavenging from interfacial layer on Si_1-xGe_x channel for high mobility Si/Si_1-xGe_x CMOS application
- - Choonghyun Lee
  - H. Kim
  - et al.
- 2016
- VLSI Technology 2016
FINFET technology featuring high mobility SiGe channel for 10nm and beyond
- - Dechao Guo
  - G. Karve
  - et al.
- 2016
- VLSI Technology 2016