A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts
- M. Eizenberg
- R.D. Thompson
- et al.
- 1982
- Journal of Applied Physics
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230 results for King-Ning Tu
SILICIDE CONTACT AND GATE IN MICROELECTRONIC DEVICES.
- K.N. Tu
- 1982
- International Symposium on Methods and Materials in Microelectronic Technology 1982
Comparison of the three classes (rare earth, refractory and near-noble) of silicide contacts
- R.D. Thompson
- K.N. Tu
- 1982
- Thin Solid Films
Lattice imaging of silicide-silicon interfaces
- L.J. Chen
- J.W. Mayer
- et al.
- 1982
- Thin Solid Films
Formation and structure of epitaxial NiSi2 and CoSi2
- L.J. Chen
- J.W. Mayer
- et al.
- 1982
- Thin Solid Films
Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films
- D. Gupta
- K.N. Tu
- et al.
- 1982
- Thin Solid Films
Low temperature doping of arsenic atoms in silicon during Pd2Si formation
- I. Ohdomari
- K. Suguro
- et al.
- 1982
- Thin Solid Films
Kinetics of interfacial reaction in bimetallic CuSn thin films
- K.N. Tu
- R.D. Thompson
- 1982
- Acta Metallurgica
Single intermetallic compound formation in Pd-Pb and Pd-Sn thin-film couples studied by X-ray diffraction
- K.N. Tu
- 1982
- Materials Letters
Contact reaction between Si and rare earth metals
- R.D. Thompson
- B.Y. Tsaur
- et al.
- 1981
- Applied Physics Letters