Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

Date

Start

End

Featured collections

Popular topics

21 results for Jingyun Zhang

SiGe Gate-All-around Nanosheet Reliability
- - Huimei Zhou
  - Miaomiao Wang
  - et al.
- 2022
- IRPS 2022
TDDB Reliability in Gate-All-Around Nanosheet
- - Huimei Zhou
  - Miaomiao Wang
  - et al.
- 2021
- IRPS 2021
Parasitic Resistance Reduction for Aggressively Scaled Stacked Nanosheet Transistors
- - Su-Chen Fan
  - Ruilong Xie
  - et al.
- 2020
- IITC 2020
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology
- - Kangguo Cheng
  - Chanro Park
  - et al.
- 2020
- VLSI Technology 2020
NBTI Impact of Surface Orientation in Stacked Gate-All-Around Nanosheet Transistor
- - Huimei Zhou
  - Miaomiao Wang
  - et al.
- 2020
- IRPS 2020
A new technique for evaluating stacked nanosheet inner spacer TDDB reliability
- - Tian Shen
  - K. Watanabe
  - et al.
- 2020
- IRPS 2020
Bias Temperature Instability Reliability in Stacked Gate-All-Around Nanosheet Transistor
- - Miaomiao Wang
  - Jingyun Zhang
  - et al.
- 2019
- IRPS 2019
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
- - N. Loubet
  - T.B. Hook
  - et al.
- 2017
- VLSI Technology 2017
A Review of the Gate-All-Around Nanosheet FET Process Opportunities
- - Sagarika Mukesh
  - Jingyun Zhang
- 2022
- Electronics (Switzerland)