In-situ characterization of SiO2 deposition and growth for gate-oxides (Invited Paper)
- M. Liehr
- 1991
- SPIE Processing Integration 1991
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49 results for Michael Liehr
HF and UV-ozone integrated wafer preclean: chemistry and effects on thermal gate oxide
- M. Liehr
- S.R. Kasi
- 1991
- SSDM 1991
Role of surface passivation in the integrated processing of MOS structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- VLSI Technology 1990
HF surface passivation failure in integrated thermal oxidation processing
- M. Liehr
- M. Offenberg
- et al.
- 1990
- SSDM 1990
In-situ characterization of impurities and defects at si interfaces
- M. Liehr
- 1989
- Proceedings of SPIE 1989
Variability and reliability analysis in self-assembled multichannel carbon nanotube field-effect transistors
- Zhaoying Hu
- George S. Tulevski
- et al.
- 2015
- Applied Physics Letters
Electron interaction mechanisms in high resolution electron energy loss spectroscopy
- P.A. Thiry
- M. Liehr
- et al.
- 2006
- Physica Scripta
Microstructure of epitaxial Ag/Si(111) and Ag/Si(100) interfaces
- F. Legoues
- M. Liehr
- et al.
- 2006
- Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Hydrogen desorption kinetics from epitaxially grown Si(100)
- C. Michael Greenlief
- Michael Liehr
- 1994
- Applied Physics Letters
Integrated Processing of MOS Gate Dielectric Structures
- G.W. Rubloff
- M. Offenberg
- et al.
- 1994
- IEEE Trans Semicond Manuf