Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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49 results for Michael Liehr

Silicon dioxide defects induced by metal impurities
- - H. Dallaporta
  - M. Liehr
  - et al.
- 1990
- Physical Review B
Equilibrium surface hydrogen coverage during silicon epitaxy using SiH₄
- - C.M. Greenlief
  - M. Offenberg
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High resolution electron energy loss spectroscopic characterization of insulators for Si technology
- - M. Liehr
  - P.A. Thiry
- 1990
- Journal of Electron Spectroscopy and Related Phenomena
integrated thermal chemical vapor deposition processing for Si technology
- - M. Liehr
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Diffuse and abrupt interface formation studied by high resolution electron energy loss spectroscopy
- - P.A. Thiry
  - R. Sporken
  - et al.
- 1990
- Superlattices and Microstructures
Defect formation in SiO₂/Si(100) by metal diffusion and reaction
- - M. Liehr
  - H. Dallaporta
  - et al.
- 1988
- Applied Physics Letters
Stacking-fault-induced defect creation in SiO₂ on Si(100)
- - M. Liehr
  - G.B. Bronner
  - et al.
- 1988
- Applied Physics Letters
Investigation of inas and gasb by high-resolution electron energy-loss spectroscopy
- - P.A. Thiry
  - J.L. Longueville
  - et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electrical properties of vacuum annealed Si surfaces
- - J. Werner
  - M. Renier
  - et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Kinetics of high-temperature thermal decomposition of Si0 2 on Si(100)
- - M. Liehr
  - J.E. Lewis
  - et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films