Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.