High order wafer alignment in manufacturing
- Michael Pike
- Nelson Felix
- et al.
- 2012
- SPIE Advanced Lithography 2012
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85 results for Nelson Felix
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- SPIE Advanced Lithography 2010
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
- Christopher P. Ausschnitt
- Timothy A. Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Predicting and reducing substrate induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
Overlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Etch and Patterning Development for 2nm Node Nanosheet Devices
- Eric Miller
- Indira Seshadri
- et al.
- 2022
- SPIE Advanced Lithography 2022
Exploration of pillar local CDU improvement options for AI applications
- Charlie Liu
- Hao Tang
- et al.
- 2020
- SPIE Advanced Lithography 2020