Strained Si channel MOSFETs with embedded silicon carbon formed by solid phase epitaxy
- Yaocheng Liu
- Oleg Gluschenkov
- et al.
- 2007
- VLSI Technology 2007
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14 results for W.K. Henson
Effect of plasma N2 and thermal NH3 nitridation in HfO2 for ultrathin equivalent oxide thickness
- Min Dai
- Yanfeng Wang
- et al.
- 2013
- Journal of Applied Physics
Intrinsic effective mobility extraction with extremely scaled gate dielectrics
- Zuoguang Liu
- Dechao Guo
- et al.
- 2010
- Applied Physics Letters
Stress liner effects for 32-nm SOI MOSFETs with HKMG
- Ming Cai
- Karthik Ramani
- et al.
- 2010
- IEEE T-ED