Effect of the surface upon misfit dislocation velocities during the growth and annealing of SiGe/Si (001) heterostructures
- E.A. Stach
- R. Hull
- et al.
- 1998
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.