High performance and low power transistors integrated in 65nm bulk CMOS technologyZ. LuoA. Steegenet al.2004IEDM 2004
The physical properties of cubic plasma-enhanced atomic layer deposition TaN filmsH. KimC. Lavoieet al.2004Journal of Applied Physics
Novel techniques for scaling deep trench DRAM capacitor technology to 0.11 μm and beyondP.S. ParkinsonK. Settlemyeret al.2003VLSI-TSA 2003