Overlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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23 results for Chris Robinson
Building an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
First microprocessors with immersion lithography
- D. Gil
- T. Bailey
- et al.
- 2005
- SPIE Advanced Lithography 2005
Progress towards developing high performance immersion compatible materials and processes
- Karen Petrillo
- Kaushal Patel
- et al.
- 2005
- Microlithography 2005
Ultrathin membrane, masks for electron projection lithography
- O.R. Wood II
- W.J. Trybula
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Thermomechanical distortions of the PREVAIL mask system during exposure
- P.-T. Lee
- C. Martin
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Image collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering