Classification of the modes of dissociation in immiscible Cu-alloy thin films
- K. Barmak
- G.A. Lucadamo
- et al.
- 1999
- MRS Spring Meeting 1999
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162 results for Cyril Cabral
Evidence of a two-stage reaction mechanism in sputter deposited Nb/Al multilayer thin-films studied by in situ synchrotron X-ray diffraction
- G.A. Lucadamo
- K. Barmak
- et al.
- 1999
- Materials Letters
(Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM
- D.E. Kotecki
- J.D. Baniecki
- et al.
- 1999
- IBM J. Res. Dev
Al-Ta bilayer as an oxidation resistant barrier for electrode structures in high dielectric constant capacitors
- A. Grill
- C. Cabral Jr.
- 1999
- Journal of Materials Research
Effects of annealing conditions on charge loss mechanisms in MOCVD Ba0·7Sr0·3TiO3 thin film capacitors
- J.D. Baniecki
- R.B. Laibowitz
- et al.
- 1999
- Journal of the European Ceramic Society
Mechanisms for microstructure evolution in electroplated copper thin films near room temperature
- J.M.E. Harper
- C. Cabral Jr.
- et al.
- 1999
- Journal of Applied Physics
In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
- S.-L. Zhang
- C. Lavoie
- et al.
- 1999
- Journal of Applied Physics
Mechanisms for enhanced C54-TiSi2 formation in Ti-Ta alloy films on single-crystal Si
- A. Quintero
- M. Libera
- et al.
- 1999
- Journal of Materials Research
Layered TaSiN as an oxidation resistant electrically conductive barrier
- A. Grill
- C.V. Jahnes
- et al.
- 1999
- Journal of Materials Research
Enhanced thermal stability of C49 TiSi2 in the presence of aluminum
- S.-L. Zhang
- F.M. D'Heurle
- et al.
- 1998
- Applied Physics Letters