Characterization of the VT-instability in SiO2 / HfO2 gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IRPS 2003
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182 results for Eduard Cartier
Charge trapping and dielectric reliability of SiO2-Al2O3 gate stacks with TiN electrodes
- Andreas Kerber
- Eduard Cartier
- et al.
- 2003
- IEEE Transactions on Electron Devices
Characterization of the VT-instability in SIO2/HFO2 gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IRPS 2003
Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IEEE Electron Device Letters
Characterization of silicate/Si(001) interfaces
- M. Copel
- E. Cartier
- et al.
- 2002
- Applied Physics Letters
Measurement of barrier heights in high permittivity gate dielectric films
- S. Zafar
- E. Cartier
- et al.
- 2002
- Applied Physics Letters
Low Weibull slope of breakdown distributions in high-k layers
- Thomas Kauerauf
- Robin Degraeve
- et al.
- 2002
- IEEE Electron Device Letters
Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
- A.C. Callegari
- E. Cartier
- et al.
- 2001
- Journal of Applied Physics
Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-κ insulator: The role of remote phonon scattering
- Massimo V. Fischetti
- Deborah A. Neumayer
- et al.
- 2001
- Journal of Applied Physics
Imaging of oxide and interface charges in SiO2-Si
- R. Ludeke
- E. Cartier
- 2001
- Microelectronic Engineering