The Impact of Self-Heating on Charge Trapping in High-k-Metal-Gate nFETs
- Faraz Khan
- Eduard Cartier
- et al.
- 2016
- IEEE Electron Device Letters
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182 results for Eduard Cartier
Evolution of interfacial Fermi level in In0.53Ga0.47As/high-κ/TiN gate stacks
- Adra Carr
- John Rozen
- et al.
- 2015
- Applied Physics Letters
Simple Gate Metal Anneal (SIGMA) stack for FinFET Replacement Metal Gate toward 14nm and beyond
- Takashi Ando
- B. Kannan
- et al.
- 2014
- VLSI Technology 2014
Metal Gate/High-κ dielectric gate stack reliability; or how i learned to live with trappy oxides
- Barry P. Linder
- Eduard Cartier
- et al.
- 2013
- ECS Meeting 2013
The past, present and future of high-k/metal gates
- Kisik Choi
- Takashi Ando
- et al.
- 2013
- ECS Meeting 2013
Switching of ferroelectric polarization in epitaxial BaTiO 3 films on silicon without a conducting bottom electrode
- Catherine Dubourdieu
- John Bruley
- et al.
- 2013
- Nature Nanotechnology
Improving and optimizing reliability in future technologies with high-κ dielectrics
- Barry P. Linder
- Eduard Cartier
- et al.
- 2013
- VLSI-DAT 2013
Improving and optimizing reliability in future technologies with high-κ dielectrics
- Barry P. Linder
- Eduard Cartier
- et al.
- 2013
- VLSI-TSA 2013
Application of VRS methodology for the statistical assessment of BTI in MG/HK CMOS devices
- Andreas Kerber
- Eduard Cartier
- 2013
- IEEE Electron Device Letters
Characterization and optimization of charge trapping in high-k dielectrics
- Eduard Cartier
- Takashi Ando
- et al.
- 2013
- IRPS 2013