Interface state density measurements in gated p-i-n silicon nanowires as a function of the nanowire diameter
- Guy Cohen
- E. Cartier
- et al.
- 2010
- DRC 2010
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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182 results for Eduard Cartier
Oxygen transport in high-κ/ metal gate stacks and physical characterization by SIMS using isotope labeled oxygen
- Marinus Hopstaken
- John Bruley
- et al.
- 2010
- ECS Transactions
The role of oxygen in the development of Hf-base high-k/metal gate stacks for CMOS technologies
- E. Cartier
- 2010
- ECS Transactions
Impact of instrumental current scatter on fast Bias Temperature Instability testing
- A. Kerber
- K. Zhao
- et al.
- 2009
- IIRW 2009
Extremely scaled gate-first high-k/metal gate stack with EOT of 0.55 nm using novel interfacial layer scavenging techniques for 22nm technology node and beyond
- K. Choi
- H. Jagannathan
- et al.
- 2009
- VLSI Technology 2009
TDDB failure distribution of metal gate / high-k CMOS devices on SOI substrates
- A. Kerber
- E. Cartier
- et al.
- 2009
- IRPS 2009
Effects of photoinduced carrier injection on time-dependent dielectric breakdown
- J.M. Atkin
- R.B. Laibowitz
- et al.
- 2009
- IRPS 2009
Stress-induced leakage current and defect generation in nFETs with HfO 2/TiN gate stacks during positive-bias temperature stress
- Eduard Cartier
- Andreas Kerber
- 2009
- IRPS 2009
The effect of interface thickness of high-k/metal gate stacks on NFET dielectric reliability
- Barry P. Linder
- Eduard Cartier
- et al.
- 2009
- IRPS 2009
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing
- M. Chudzik
- B. Doris
- et al.
- 2007
- VLSI Technology 2007